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Research and development of technology of DOE microrelief formation on sapphire substrates

A.V. Volkov1,2, O.G. Istinova 2, N.L. Kazanskiy1,2, G.F. Kostyuk2
1 Image Processing Systems Institute of RAS

 2 Samara State Aerospace University


 PDF, 118 kB

Pages: 70 - 73.

Abstract:
A method for the formation of the phase microrelief of sapphire (leucosapphire) diffractive optical elements (DOE) has been proposed and implemented. Using this method, a binary structure on a sapphire substrate was produced and investigated, this structure operates in ultraviolet range as a diffractive lens with a focal length of f≈50 mm. It is shown that sapphire is a real alternative to quartz plates and diamond-like films when used as a DOE substrate material. The parameters were chosen for the formation of a given microrelief on sapphire substrates on the basis of ion-chemical etching in Freon-14.

Keywords:
DOE, on sapphire substrate, binary structure, ultraviolet range, quartz plate, Freon-14.

Citation:
Volkov AV, Istinova OG, Kazanskiy NL, Kostyuk GF. Research and development of technology of DOE microrelief formation on sapphire substrates. Computer Optics 2002; 24: 70-73.

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