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Frictional scanning probe lithography of advanced materials for dielectric nanophotonics
P.A. Alekseev1, M.E. Popov1, K.A. Gasnikova1, B.R. Borodin1, I.A. Eliseyev1, V.V. Fedorov2

1Ioffe Institute, 26 Polytekhnicheskaya St., St. Petersburg, 194021, Russia;
2Alferov University, 8/3 Khlopina St., St. Petersburg, 194021, Russia

  Полный текст (PDF)

DOI: 10.18287/COJ1838

ID статьи: 1838

Abstract:
Creating photonic circuits based on advanced dielectric nanophotonic materials is complicated by the difficulty of selecting effective etchants when using standard lithography methods. We propose a universal approach of frictional mechanical scanning probe lithography, which consists of the local removal of material using a sharp diamond probe tip. We demonstrate planar waveguides and disk microresonators made from 200 nm thick GaP layer grown on sapphire substrate and a 40 nm thick MoSe2 microdisk cavities exhibiting an optical quality factor reaching 100.

Keywords:
scanning probe lithography, dielectric nanophotonics, transition metal dichalcogenides, MoSe2, gallium phosphide, waveguide, cavity, resonator.

Citation:
Alekseev PA, Popov ME, Gasnikova KA, Borodin BR, Eliseyev IA, Fedorov VV. Frictional scanning probe lithography of advanced materials for dielectric nanophotonics. Computer Optics 2026; 50(2): 1838. DOI: 10.18287/COJ1838.

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